Lam Research 16-LINE IGS GAS BOX 571-033051-003 571-033051-13589C1
Lam Research 16-LINE IGS GAS BOX
Part Number: 571-033051-003
Assembly Number: 571-033051-13589C1
Manufacturer: Lam Research
Product Overview
The 16-Line IGS (Integrated Gas System) Gas Box is a critical gas delivery subsystem used in Lam Research plasma etch and deposition platforms (such as 2300 series process modules). It provides precise, safe, and repeatable delivery of multiple process gases to the reaction chamber.
This unit integrates gas distribution, regulation, and safety interlocks into a single modular enclosure for semiconductor wafer processing tools.
Gas boxes like this are commonly installed in Lam process modules PM2/PM3/PM4 and support advanced plasma etch processes.
Key Functions
1) Multi-Gas Distribution
The 16-line IGS gas box allows simultaneous control of multiple specialty gases used in plasma etching, including:
Typical supported gases:
- N₂ (Nitrogen)
- Ar (Argon)
- O₂ (Oxygen)
- BCl₃ (Boron trichloride)
- CF₄ / SF₆ / NF₃ and other etch gases
These gases are delivered through independent mass flow control channels to ensure accurate recipe execution.
2) Mass Flow Control Integration
Typical configuration includes:
- Up to 16 MFC channels
- High-purity gas valves (Veriflo / equivalent)
- Pressure regulators
- Solenoid valve arrays
- Stainless steel VCR/VCO gas lines
Example configurations in similar Lam gas boxes show integrated mass flow controllers and high-purity valves designed for semiconductor fabs.
3) Process Stability & Repeatability
The gas box ensures:
- Stable gas mixing ratios
- Fast response to recipe changes
- Repeatable wafer-to-wafer processing
- Reduced contamination risk
This is essential for high-precision plasma etching processes.
4) Safety & Interlocks
IGS gas boxes include semiconductor-grade safety features:
- Leak-tight high-purity gas manifold
- Pressure monitoring
- Interlock circuitry
- Emergency shutoff capability
- Integration with tool safety systems
These features protect both equipment and fab operators.
Typical Applications
Used in Lam platforms for:
- Dielectric etch
- Metal etch
- Polysilicon etch
- Chamber clean processes
- Plasma surface treatment
The 16-line configuration supports complex multi-gas plasma recipes required in advanced semiconductor manufacturing.
Compatible Equipment
Commonly used with:
- Lam Research 2300 series etchers
- TCP / Flex / Kiyo process modules
- Plasma etch and clean systems
Key Advantages
- High-purity semiconductor gas delivery
- Modular plug-and-play design
- Supports advanced multi-gas recipes
- Designed for high uptime in fabs
- Critical spare for tool maintenance and refurbishment
Typical Market Status
These gas boxes are typically available as:
- Surplus / refurbished parts
- Used spare assemblies
- Refurbishment candidates
They are frequently listed as IGS 16-Line Gas Box spare parts in semiconductor equipment inventory.
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